Fabrication of Metal Oxide Thin Film Electronics Using Roll-to-Roll Imprint Lithography

Warren Jackson received his Ph. D at Berkeley 1981 and his B.S. Stanford in 1976 and joined Xerox Palo Alto Research center in 1981. During 20 years there he has studied many aspects of amorphous materials and devices, studied contact effects, developed photothermal deflection spectroscopy for thin amorphous films, investigated inverse photoemission of semiconductors, studied charge trapping in insulators, measured the self energy correction for crystalline semiconductors, studied H trapping and effusion in amorphous solids, developed human-vision-model based image quality designs, worked on hyperacuity smart amorphous image sensors, printed circuit board based MEMS, and distributed control of hyper-redundant systems. In 2001, he joined Hewlett-Packard Labs where he currently is studying amorphous and organic memory devices, tunneling, image resolution, and roll-to-roll fabrication of large area devices. He has published over 200 papers and has been granted over 77 patents. He is a Fellow in the American Physical Society and a member of the Materials Research Society.

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