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Stable Low Temperature Multicomponent Oxides

Warren Jackson,
Hewlett-Packard, USA
United States
 
 
This presentation was given at Printed Electronics & Photovoltaics USA 2009 on Dec 03, 2009.
 

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Presentation Summary

  • Discuss metastable effects in oxide devices
  • Produced stable devices at processing temperatures
  • Created oxide transistors using roll-to-roll imprint lithography

Speaker Biography (Warren Jackson)

Warren Jackson received his Ph. D at Berkeley 1981 and his B.S. Stanford in 1976 and joined Xerox Palo Alto Research center in 1981. During 20 years there he has studied many aspects of amorphous materials and devices, studied contact effects, developed photothermal deflection spectroscopy for thin amorphous films, investigated inverse photoemission of semiconductors, studied charge trapping in insulators, measured the self energy correction for crystalline semiconductors, studied H trapping and effusion in amorphous solids, developed human-vision-model based image quality designs, worked on hyperacuity smart amorphous image sensors, printed circuit board based MEMS, and distributed control of hyper-redundant systems. In 2001, he joined Hewlett-Packard Labs where he currently is studying amorphous and organic memory devices, tunneling, image resolution, and roll-to-roll fabrication of large area devices. He has published over 200 papers and has been granted over 77 patents. He is a Fellow in the American Physical Society and a member of the Materials Research Society.

Company Profile (Hewlett Packard)

HP is the world's largest IT Company. We create technology solutions that provide new possibilities for consumers and business with a portfolio that spans printing, personal computing, software, services and IT infrastructure. HP was founded in 1939; it is headquartered in Palo Alto California. It was 10th on the 2010 Fortune 500 ranking with revenue of $126 billion.

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