| 1. | EXECUTIVE SUMMARY |
| 1.1. | Glass materials |
| 1.2. | Applications of glass in semiconductors |
| 1.3. | Glass for advanced packaging |
| 1.4. | Glass used in various semiconductor applications |
| 1.5. | Opportunities ahead with glass packaging |
| 1.6. | Key advantages of glass substrates |
| 1.7. | Challenges in adopting glass substrates |
| 1.8. | Future market trends |
| 1.9. | Future development directions: Advanced processing technologies |
| 1.10. | Future development directions: Integrated packaging solutions & Sustainable manufacturing initiatives |
| 1.11. | Beneficiaries of glass core substrate introduction |
| 1.12. | Value chain of glass substrate |
| 1.13. | Value chain shift from organic to glass core substrate |
| 1.14. | Future outlook |
| 1.15. | Material innovations |
| 1.16. | Investment priority areas |
| 1.17. | Activities of representative players |
| 2. | MARKET FORECAST |
| 2.1. | Market forecast segmentation |
| 2.2. | Market forecast methodology |
| 2.3. | Unit shipment forecast 2025-2036 |
| 2.4. | Market value forecast 2025-2036 |
| 2.5. | Market trends |
| 2.6. | 2025 vs. 2036 markets |
| 2.7. | Market and economic factors |
| 3. | GLASS IN ADVANCED PACKAGING AND IC SUBSTRATE |
| 3.1. | Dimensionality of advanced packaging |
| 3.2. | From 1D semiconductor packaging |
| 3.3. | Advanced packaging 2D & 2D+ |
| 3.4. | Advanced packaging 2.5D & 3D |
| 3.5. | Advanced packaging 3.5D & 4D |
| 3.6. | Technology development trend for 2.5D and 3D packaging |
| 3.7. | Intel's advanced packaging roadmap |
| 3.8. | Heterogeneous integration solutions |
| 3.9. | Overview of System on Chip (SOC) |
| 3.10. | Overview of Multi-Chip Module (MCM) |
| 3.11. | System in Package (SiP) |
| 3.12. | Analysis of System in Package (SiP) |
| 3.13. | Glass IC substrates |
| 3.14. | From Organic to Glass Core Substrate |
| 3.15. | Evolution of packaging substrates in semiconductors |
| 3.16. | From organic to glass core |
| 3.17. | Organic core substrate vs. glass core substrate |
| 3.18. | TSV vs. TGV |
| 3.19. | Material property comparison for advanced packaging |
| 3.20. | Key mechanical and reliability benefits of glass |
| 3.21. | I/O density |
| 3.22. | Key factors enabling fine circuit patterns on glass substrates |
| 3.23. | Fine circuit patterning reduces DoF |
| 3.24. | FC-BGA substrates lead to larger distortions |
| 3.25. | Limitations of Via formation |
| 3.26. | SAP method limitations |
| 3.27. | PCB stack-ups |
| 3.28. | Traditional multilayer vs. build-up PCBs |
| 3.29. | Build-up material: ABF |
| 3.30. | ABF substrate manufacturing process |
| 3.31. | Flip Chip Ball Grid Array (FC-BGA) substrate |
| 3.32. | Glass core substrate |
| 3.33. | Glass core substrate technologies |
| 3.34. | Glass interposer vs. silicon interposer |
| 3.35. | Through Glass Via Formation |
| 3.36. | Through glass via formation process |
| 3.37. | Comparison of through glass via formation processes |
| 3.38. | TGV process and via formation methods |
| 3.39. | Mechanical and high-power laser drilling |
| 3.40. | Laser-induced deep etching |
| 3.41. | LMCE from BSP |
| 3.42. | Philoptics' TGV technology |
| 3.43. | Laser-induced modification and advanced wet etching |
| 3.44. | Comparison among the TGV processes |
| 3.45. | Photosensitive glass and wet etching |
| 3.46. | Samtec's TGV technology |
| 3.47. | TGV of high aspect ratio |
| 3.48. | TGV Metallization |
| 3.49. | TGV metallization processes |
| 3.50. | Two-step process |
| 3.51. | Seed layer deposition in TGV metallization |
| 3.52. | Factors for alternative TGV metallization process |
| 3.53. | Comparison of TGV metallization processes |
| 3.54. | Glass Substrate Manufacturing |
| 3.55. | Technology: Organic core substrate vs. glass core substrate |
| 3.56. | Glass core substrate: Core layer fabrication |
| 3.57. | Glass core substrate: Build-up layer fabrication |
| 3.58. | Manufacturing process of glass substrate (CHIMES) |
| 3.59. | Achieving 2/2 μm L/S on glass substrate |
| 3.60. | Glass fabrication process by Georgia Institute of Technology |
| 3.61. | Glass core 3D integration: Georgia Tech's embedded die packaging |
| 3.62. | Glass cavity lamination process flow by Georgia Institute of Technology |
| 3.63. | Chip-first non-TSV 3D glass panel embedding |
| 3.64. | Georgia Institute of Technology test vehicle comparison |
| 3.65. | Intel's glass line |
| 3.66. | Features of Glass-based Advanced Packaging and IC Substrates |
| 3.67. | TGV - Player and products benchmark |
| 3.68. | Advanced thermal management for glass packages |
| 3.69. | Shifting dynamics and emerging leaders in glass core substrate and interposer patent activity |
| 3.70. | Glass substrate adoption innovations in semiconductor packaging |
| 3.71. | Glass innovation efforts |
| 3.72. | Plan Optik AG |
| 3.73. | Plan Optik AG's Technology |
| 3.74. | KCC |
| 3.75. | Intel's glass substrate efforts |
| 3.76. | Absolics' progresses |
| 3.77. | CHIMES' focus on glass in advanced packaging |
| 4. | GLASS IN PHOTONICS |
| 4.1. | What is a photonic integrated circuit? |
| 4.2. | Why PICs? |
| 4.3. | Optical coupling - I/O |
| 4.4. | EIC/PIC integration |
| 4.5. | Co-Packaged Optics |
| 4.6. | Co-packaged optics architecture |
| 4.7. | Key trend of optical transceiver |
| 4.8. | Glass-based CPO integration |
| 4.9. | Glass interposer-based CPO architecture |
| 4.10. | Ion exchange waveguide formation technology |
| 4.11. | Dual-mode glass waveguide performance characteristics |
| 4.12. | Adiabatic glass-to-silicon waveguide coupling for CPO integration |
| 4.13. | Glass-based fiber connector assembly for CPO applications |
| 4.14. | Glass interposer optical signal path architecture |
| 4.15. | Glass interposer manufacturing process and laser separation technology |
| 4.16. | Corning's high-density 102.4 Tb/s glass integration platform |
| 4.17. | 3D integration of EIC/PIC with a glass interposer |
| 4.18. | 3D integration of EIC, PIC, ASIC on a co-packaged glass substrate |
| 4.19. | Fabrication process of the 3D integration of ASIC, EIC, PIC on a co-packaged substrate |
| 4.20. | Advancements in glass integration for photonics |
| 5. | GLASS IN HIGH-FREQUENCY APPLICATIONS |
| 5.1. | Applications of low-loss materials in semiconductor and electronics packaging |
| 5.2. | Transmission loss in high-frequency PCB design |
| 5.3. | Glass as a low-loss material |
| 5.4. | Categories of RF applications enabled by glass in semiconductor technology |
| 5.5. | Benchmark of LTCC and glass materials |
| 5.6. | Dielectric constant: Stability vs frequency for different inorganic substrates (LTCC, glass) |
| 5.7. | Benchmarking of commercial low-loss materials for 5G PCBs/components |
| 5.8. | Five important metrics impacting low-loss materials selection |
| 5.9. | Glass suppliers: JSK's HF-F for low transmission loss laminates |
| 5.10. | Glass suppliers: SCHOTT's FLEXINITY connect |
| 5.11. | Glass suppliers: AGC/ALCAN System's transparent antennas for windows |
| 5.12. | Glass as a filter substrate |
| 5.13. | Glass integrated passive devices (IPD) filter for 5G by Advanced Semiconductor Engineering |
| 5.14. | Glass substrate AiP for 5G: Georgia Tech |
| 5.15. | Glass for 6G: Georgia Tech |
| 5.16. | Glass interposers for 6G |
| 5.17. | Access More With an IDTechEx Subscription |