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Conference Agenda

 
 

Wednesday, 30 Sep 2009

Track 1

 Radical New Printed Electronics Products
09:00IDTechEx
 Printed Electronics in Healthcare
09:50Palo Alto Research Center (PARC)
09:25Imperial College London
 Transistors
10:40Coffee & Networking Break
14:25Dai Nippon Printing
12:15Sony
12:40Lunch
14:00Toppan Printing
11:50Tokyo Institute of Technology
10:15Cambridge University
11:25Faculdade de Ciencias e Tecnologia
 E-Readers
14:50Bridgestone Corporation
15:15Coffee & Networking Break

Track 1

 Graphene & Carbon Nanotubes
16:00Fujitsu Laboratories
16:25NEC
16:50Vorbeck Materials
17:15Day 1 Ends

Thursday, 01 Oct 2009

Track 1

 Flexible Displays & Lighting
09:25University of Tokyo
09:50Kodak Japan
09:00Liquavista
10:15Samsung Advanced Institute of Technology
10:40Coffee & Networking Break
 Memory
11:20Thin Film Electronics
 Processing
12:35Nano ePrint Ltd
12:10Nottingham Trent University
11:45Mitsubishi Materials Corporation
13:00Lunch
 Transparent Electronics
14:50H.C. Starck Clevios
14:25Agfa Materials
 Conductive Inks
15:15Hitachi Chemical
15:40Coffee & Networking Break
 RFID
16:10Mighty Card Corporation
16:35Sunchon National University
17:00Day 2 Track 1 Ends

Track 2

 Photovoltaics
09:50Solarmer Energy
10:40Coffee & Networking Break
12:10University of Manchester
12:35University of Surrey
10:15imaging Technology international (iTi)
13:00Lunch
14:25Trident Industrial Inkjet
09:00IDTechEx
09:25centrotherm photovoltaics
11:45Fluxim
11:20PixDro
 Energy Harvesting & Storage
14:50CSIRO
 Barrier Layers
15:40Coffee & Networking Break
16:35A*Star / Nanyang Technological University
15:15Vitex Systems
16:10IDTechEx
17:00Day 2 Track 2 Ends
 
 
 

Wednesday September 30, 2009

Transistors (10:15 - 14:50)

Cambridge University, Dr Flora Li, Research Associate
10:15 - 10:40 "Fabrication and Stability Characterisation of Thin Film Transistors Based on Indium Zinc Oxide Deposited at Low Temperature"
  • The deposition of metal oxides (e.g., indium zinc oxide, zinc oxide, hafnium oxide, aluminium oxide) using a high rate sputtering technology will be described.
  • Thin film transistors fabricated using amorphous indium zinc oxide as the channel layer will be shown to have a field effect mobility of 10 cm2 V-1 s 1, which is an order of magnitude better than amorphous silicon technology.
  • The results of stressing metal oxide thin film transistors will be presented to allow assessment of stability.
 
10:40 Coffee & Networking Break
 
Faculdade de Ciencias e Tecnologia, Professor Elvira Fortunato
11:25 - 11:50 "From e-paper to paper-e"
 
 
Tokyo Institute of Technology, Dr Hideo Hosono, Professor
11:50 - 12:15 "Development of Inorganic Thin Film Transistors"
 
 
Sony, Mr Toshio Fukuda,
12:15 - 12:40 "Ink Formulation and Printing Technique for OTFTs"
 
 
12:40 Lunch
 
Toppan Printing, Mr Toru Okubo, Research Leader
14:00 - 14:25 "Development of Printed Organic Thin Film Transistors"
  • Printing techniques for organic TFTs
  • Challenges to organic TFTs with high performance and reliability
  • Printed organic TFT backplane for electrophoretic displays
 
Dai Nippon Printing, Dr Hiroki Maeda, General Manager
14:25 - 14:50 "Flexible Electronics by Printed Circuits"
  • Printed Electronics in DNP
  • Flexible TFTs for printed electronics
  • Flexible displays with Flexible TFTs
 
 
Learn about all the technologies, all the applications and all the opportunity at Printed Electronics Asia. IDTechEx is running an exclusive VIP Tour to Tokyo, Japan with company visits, a 2 day conference and exhibition. Meet, learn from, and network with the leading companies involved in organic, printed inorganic and other thin film electronics in East Asia.
 

 

 
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