The Present Status and New Applications of Oxide Semiconductors (Printed Electronics Europe 2013)

Prof Toshio Kamiya, Associate Professor
Tokyo Institute of Technology
Avr 18, 2013.


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Presentation Summary

  • Give a brief summary of history, technical advantage of oxide semiconductor
  • Review the present status of amorphous oxide semiconductor technology
  • Review new applications of oxide semiconductor technology - Discuss the present issues for mass-production of amorphous oxide semiconductor devices

Speaker Biography (Toshio Kamiya)

Toshio Kamiya is a professor in the Materials and Structures Laboratory at Tokyo Institute of Technology. He started his research carrier as an assistant professor of Department of Inorganic Materials at Tokyo Tech. in 1991, working on ferroelectric inorganic materials, and received PhD degree in 1996. He moved to Interdisciplinary Graduate School of Science and Engineering and engaged in silicon thin films from 1996 to 2000. He spent two years at Microelectronics Research Centre, Cavendish Laboratory at the University of Cambridge as a visiting scholar from 2000 to 2002, studying on single-electron transistors. He became an associate professor in 2002 and has studied exploration and device applications of function oxide materials. He was promoted to a professor in August, 2010. His field of research includes exploration, materials design, and device applications of new functional oxides. He has published about 300 scientific papers and awarded with Tejima Research Award (Invention) in 2011, Paper Award of Journal of The Surface Science Society of Japan in 2010, Outstanding Poster Paper Award, IDW'09, The JJAP Paper Award by Japanese Society of Applied Physics in 2009, The Young Scientists' Prize by MEXT in 2007, The Advanced Technology Award by the Fuji-Sankei group in 2005, and The DV-X Research Award for young scientist by the Society for Discrete Variational X in 1998.

Company Profile (Tokyo Institute of Technology)

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