QUOTES

Konferenz Agenda

 

Tuesday, 13 Apr 2010

 Keynote Speakers
08:45Nokia
09:35Procter & Gamble
10:25Refreshment Break
11:55Sharp Laboratories of America
12:20Stora Enso Packaging Boards
11:05Plastic Logic GmbH
08:30IDTechEx
10:00DARPA MTO
12:20Ericsson
09:10TOTAL S.A. - Gas & Power
11:30ST Ericsson
12:45LUNCH

Track 1

 End Users
14:40Electrolux Italia S.p.A
15:05Kimberly-Clark
14:15Novalia
 Transit
15:55Break
16:35RATP (Paris Transport)
15:30Cubic Transportation Systems
 Healthcare
17:00E2M Technology Limited
 Commercial progress with Electroluminescent technology
17:50Pelikon Ltd
17:25Lumoza NV & IMO
18:15Day 1 Track 1 Ends

Track 2

 The E-reader Surge
14:40E Ink Corporation
15:05Bridgestone Corporation
14:15iRex Technologies BV
 Printed RFID
15:55Refreshment Break
16:35Sunchon National University
15:30Seoul National University
 Smart Textiles
17:50TNO Holst Center
17:25National Physical Laboratory
17:00Ohmatex ApS

Track 3

 Photovoltaics - Flexible/Portable Power
15:05Ascent Solar
14:15IDTechEx
14:40Bosch Rexroth AG
15:30Neuber
15:55Refreshment Break
 Inorganic Technologies
17:25Sandia National Laboratories
17:50Solarion AG
16:35EMPA
17:00Q-mo solar AG
18:15Day 1 Track 3 Ends

Wednesday, 14 Apr 2010

Track 1

 New Enabling Products
08:55Acreo
08:30IDTechEx
 Integrating Printed Electronics
09:20Soligie
 Flexible Printed LCD Displays
10:10Refreshment Break
11:15Hong Kong University of Science and Technology
10:50Kent Displays Inc
09:45LG Display
 OLED Lighting and Displays
11:40Au Optronics Corporation
12:05Samsung Advanced Institute of Technology
12:30LUNCH
 Electrochromic & Electrowetting Displays
14:00Siemens AG
14:25ADT GmbH
14:50Liquavista
 Architectural Lighting
15:15Ryan Harc Design
 Stretchable Electronics
15:40MC10
16:05Refreshment Break
 Global Trends & Developments
16:45National Science Foundation
17:35Faraday
17:10PolyPhotonix
18:00Day 2 Track 1 Ends

Track 2

 Printed Silicon
08:30NanoGram Corp
08:55University of Cape Town
 CNT & Graphene
09:20Fujitsu Laboratories Ltd
09:45Canatu Oy
10:10Refreshment Break
 The Rise of Zinc Oxide Electronics
10:50Cambridge University
11:40Hewlett-Packard
11:15Fraunhofer IST
 The Copper Ink Breakthrough
12:05NovaCentrix
12:30LUNCH
14:00Hitachi Chemical Co Ltd
 Thin Flexible Batteries
14:25Uppsala University
14:50Hochschule der Medien Stuttgart
 Replacing ITO
15:15Agfa Materials
15:40Fraunhofer ISC
16:05Refreshment Break
16:45Day 2 Track 2 Ends

Track 3

 Organic and DSSC Photovoltaics
10:10Refreshment Break
10:50TU Dresden
08:55IDTechEx
11:40Coatema Coating Machinery GmbH
09:20CSIRO
09:45Dyesol
08:30Konkuk University
11:15Universitat Jaume I
 Barrier Materials
12:053M Display & Graphics Business Lab
12:30LUNCH
14:25DELO Industrial Adhesives
14:00TNO Holst Center
Huntsman Advanced Materials Switzerland
 Testing & Inspection
14:50Atlas MTT GMBH
 Sensors
15:15VTT Technical Research Centre of Finland
 Energy Harvesting for Printed Electronics
15:40University of Southampton
16:05Dat 2 Track 3 Ends

Track 4

 Memory & Transistors
09:20Toppan Printing Co Ltd
09:45Nano ePrint Ltd
08:55HUECK FOLIEN Ges.m.b.H.
08:30NIST
10:10Refreshment Break
 Printing
11:15Xennia Technology Ltd
12:30LUNCH
15:15Technische Universität Darmstadt
12:05Optomec Inc
14:00Daetwyler R&D Corp
14:50Fundacio Privada Cetemmsa
10:50Flexible Display Roll to Roll Research Center(FDRC)
14:25Korea Institute of Machinery and Materials
11:40PixDro b.v.
15:40MatOx Limited
16:05Refreshment Break
16:45Day 2 Track 4 Ends
 
 
 

Wednesday April 14, 2010

The Rise of Zinc Oxide Electronics (10:50 - 12:05)

Cambridge University, Department of Engineering, United Kingdom, Dr Flora Li, Research Associate
10:50 - 11:15 "Advances in Zinc Oxide-Based Transparent TFTs Produced at Low Temperature."
  • A brief introduction to High Target Utilization Sputtering (HiTUS) and its advantages over competing technologies.
  • The structure of the TFT devices produced by HiTUS will be presented and will detail the reproducibility of the devices together with a discussion of how the fabrication process varies the TFT parameters.
  • The performance of devices such as inverters and ring oscillators will also be demonstrated.
 
Fraunhofer IST, Germany, Dr Bernd Szyszka, Large Area Coating
11:15 - 11:40 "Patterned Deposition of Transparent and Conductive Layers - New Pathways Towards Cost Efficient Manufacturing Techniques"
  • Sol-gel processing of TCO thin films
  • Pad-printing of 2-D structured ITO films
  • Implementation of printed ITO films into OLED production
 
Hewlett-Packard, United States, Dr Warren Jackson, Principal Technologist
11:40 - 12:05 "Roll-to-Roll Fabrication of Large Area Electronics: Imprinting, Testing, Defect Detection"
The transition from wafer-based photolithographic batch processing to roll-to-roll, imprint based processing requires new approaches in a number of areas
  • Imprint lithography requires control of a number of key parameters to insure uniformity and high imprint quality
  • Testing on roll-to-roll dimensionally unstable substrates requires new approaches to probing and electrical testing
  • Defect detection is must handle the flexibility of the substrate and the novel nature of roll-to-roll imprint defects
 
 
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