Printing Of Nano And Microelectronics And Sensors

Prof Ahmed A. Busnaina, NSF Center Director
Northeastern University
United States
 

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Europe 2017 Presentation - Northeastern University*
Europe 2017 Audio Presentation - Northeastern University*

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プレゼンテーション概要

A new printing technology for printing of nano and microlectronics and Sensors on Flexible or Rigid Substrates has been developed. The new technology is capable of printing feature a 1000 times smaller (about 20 nanometers) than inkjet. This printing technology can print inorganic or organic conductors, semiconductors (including III-V and II-VI), and dielectrics. This presentation will show the applications of this technology in printing electronics and sensor applications.

講演者の経歴 (Ahmed A. Busnaina)

Ahmed A. Busnaina, Ph.D. is the William Lincoln Smith Chair Professor, Distinguished University Professor and founding Director of National Science Foundation's Nanoscale Science and Engineering Center for High-rate Nanomanufacturing and the NSF Center for Nano and Micro-contamination Control at Northeastern University, Boston, MA. Prof. Busnaina is internationally recognized for his work on nano and micro scale defects in nano and microfabrication. He specializes in directed assembly-based printing of micro and nanoscale devices. He developed many manufacturing techniques for nanomaterials based electronics, sensors, energy, biomedical and materials applications. His research support exceeds $50 million. He authored more than 600 papers in journals, proceedings and conferences in addition to 25 filed and awarded patents. He is an associate editor of the Journal of Nanoparticle Research. He also serves on many advisory boards including Samsung Electronics, International Technology Roadmap for Semiconductors, Journal of Particulate Science and Technology, Journal of Electronic Materials Letters. He is a fellow of the American Society of Mechanical Engineers, and the Adhesion Society, a Fulbright Senior Scholar and listed in Who's Who in the World.

会社紹介 (NSF Center for High-Rate Nanomanufacturing)

NSF Center for High-Rate Nanomanufacturing logo
The NSF Nanoscale Science and Engineering Center for High-rate Nanomanufacturing (CHN) at Northeastern University in Boston, MA is a research center focused on nanomanufacturing processes and designing sensors and other products using these processes. Headquartered at Northeastern University in Boston, we create and translate knowledge so that nanotechnology can better meet global and societal needs. The research and development work is focused on: nanomanufacturing processes, nanotechnology-enabled products and applications and environmental health & safety of nanomanufacturing and nano-enabled products, and regulatory and ethical issues.
View NSF Center for High-Rate Nanomanufacturing Timeline