Paragraf has perfected and patented a process for depositing single atom thick, two-dimensional materials, including graphene, directly onto silicon, silicon-carbide, sapphire, gallium-nitride and other semiconductor-compatible substrates. The contamination-free technology is scalable and compatible with existing electronic device manufacturing processes.
Serving the sensor, energy harvesting and semiconductor markets Paragraf is developing next generation electronic devices to exploit the unique properties of graphene, at wafer scale.
The company is now focused on commercialising its first graphene based family of sensors.
Based near Cambridge, U.K., Paragraf is a spin-out from the Department of Materials Science at Cambridge University..